Case Summary:

Our materials science NIW (National Interest Waiver) client from Taiwan proposed to carry out his research on analyzing component performance in cutting-edge lithography devices using mechanical and thermal simulations in order to find and mitigate the core causes of critical structural problems, product defects, and machine instability. We deduced that his research has substantial merit and national importance among other applications as his research is relevant to the technological growth of semiconductor manufacturing.

When he approached the North America Immigration Law Group, we thoroughly examined his prior records and built a petition package that was best suited for him. We made a strong case that he dedicated his exceptional research efforts to the field of materials science, leading to incredible achievements that have elevated the United States to the forefront of this field.

Firstly, we noted that the 6 peer-reviewed journal articles (3 of them first-authored) resulting from his study have been published in at least 5 highly regarded peer-reviewed journals. Besides, his peers have been impacted by his study as his research has been cited a total of 97 times, implying that our client’s research has directly benefitted others in the field and that he has had a major impact on his peers’ comprehension of these subjects.

That being said, we confirmed that he held an M.S. and Ph.D. in materials science and engineering while employed as applications engineer for a reputable semiconductor company. In support letters, other experts have delved into greater detail about the important nature of our client’s history and experience.

Furthermore, he was awarded funding for his research from the National Science Foundation (NSF) and the Army Research Lab (ARL). Projects that advance technological innovation, improve the welfare of the country and fortify national defense are funded by the NSF and the ARL. Therefore, this support for his work serves as proof that his research advances the objectives of these organizations.

We successfully addressed how his research project is significant since it explores the analysis of components in lithography devices through advanced thermal and mechanical simulations, bolstering his NIW case. Therefore, North America Immigration Law Group successfully convinced USCIS that our client has effectively propelled economic growth, and cemented the U.S.’s technological supremacy in his chosen field.

He thus makes contributions of such significance that, taken together, they would be beneficial to the United States, considering his track record of successful research in his field of materials science that greatly promotes American interests. It was therefore shown that he deserved to be allowed to continue with his studies in the United States. His NIW case was approved just 3 days after he applied for the premium processing service upgrade. We are honored that he chose our law firm to handle his NIW case, and also, retained us for his I-485 application. We want to do all in our power to support him going forward, wish him luck in all of his future endeavors and hope he gets his green card as soon as possible.